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dc.contributor.authorQazi Muhammad, Humayun
dc.contributor.authorUda, Hashim, Prof. Dr.
dc.date.accessioned2014-02-24T04:53:14Z
dc.date.available2014-02-24T04:53:14Z
dc.date.issued2012-12
dc.identifier.citationAdvanced Materials Research, vol.626, 2012, pages 942-947en_US
dc.identifier.issn1022-6680
dc.identifier.urihttp://dspace.unimap.edu.my:80/dspace/handle/123456789/32126
dc.descriptionLink to publisher's homepage at http://www.scientific.neten_US
dc.description.abstractA compact nanolaboratory on single chip is one of the challenging tasks for future reproductively of sensitive and selective lab-on-chip. This paper reports a simple and controllable technique for patterning microgap structures on (PR-1 2000A) positive photoresist. For the pattern transformation conventional lithography technique was used integrated with precise resolution mask namely chrome mask. This technique provides an especially simple method for the formation of micro features sizes of gaps onto the photoresist. The thickness of developed microgap structures on photoresist directly relates with the coating speed of spin coater.en_US
dc.language.isoenen_US
dc.publisherScientific.Neten_US
dc.subjectChrome masken_US
dc.subjectLab-on-chipen_US
dc.subjectMicrogapen_US
dc.subjectPhotoresisten_US
dc.subjectSpin coatingen_US
dc.subjectSurface nanoprofileren_US
dc.titleParametric study and thickness evaluation of photoresist development for the formation of microgap electrodes using surface nanoprofileren_US
dc.typeArticleen_US
dc.identifier.urlhttp://www.scientific.net/AMR.626.942
dc.contributor.urluda@unimap.edu.myen_US
dc.contributor.urlqhumayun2@gmail.comen_US


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