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dc.contributor.authorYarub, Al-Douri, Assoc. Prof. Dr.
dc.date.accessioned2014-03-04T14:41:17Z
dc.date.available2014-03-04T14:41:17Z
dc.date.issued2013
dc.identifier.citationProcedia Engineering, vol. 53, 2013, pages 400-404en_US
dc.identifier.isbn978-162748634-7
dc.identifier.issn1877-7058
dc.identifier.urihttp://www.sciencedirect.com/science/article/pii/S1877705813001719
dc.identifier.urihttp://dspace.unimap.edu.my:80/dspace/handle/123456789/32338
dc.descriptionLink to publisher's homepage at www.elsevier.comen_US
dc.description.abstractElectrochemical deposition method is used to prepare GaN nanostructure. The morphological studies using scanning electron microscopy (SEM), photoluminescence (PL) the refractive index and optical dielectric constant are investigated experimentally and theoretically, respectively. These investigations are found to be dependent on the growth time. The nanosize effect is noticed for UV detectors applications. The calculated results are in agreement with experimental and theoretical data.en_US
dc.language.isoenen_US
dc.publisherElsevier B.V.en_US
dc.subjectElectrochemicalen_US
dc.subjectGaN nanostructureen_US
dc.subjectPhotoluminescence (PL)en_US
dc.titleOptical properties of GaN nanostructures for optoelectronic applicationsen_US
dc.typeArticleen_US
dc.contributor.urlyarub@unimap.edu.myen_US


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