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dc.contributor.authorGan, Chong Leong
dc.contributor.authorUda, Hashim, Prof. Dr.
dc.date.accessioned2014-04-24T14:13:23Z
dc.date.available2014-04-24T14:13:23Z
dc.date.issued2013-11
dc.identifier.citationPLoS ONE, vol. 8(11), 2013, pages 1-8en_US
dc.identifier.issn1932-6203
dc.identifier.urihttp://www.plosone.org/article/info%3Adoi%2F10.1371%2Fjournal.pone.0078705
dc.identifier.urihttp://dspace.unimap.edu.my:80/dspace/handle/123456789/34036
dc.descriptionLink to publisher's homepage at http://www.plos.org/en_US
dc.description.abstractThis paper compares and discusses the wearout reliability and analysis of Gold (Au), Palladium (Pd) coated Cu and Pd-doped Cu wires used in fineline Ball Grid Array (BGA) package. Intermetallic compound (IMC) thickness measurement has been carried out to estimate the coefficient of diffusion (Do ) under various aging conditions of different bonding wires. Wire pull and ball bond shear strengths have been analyzed and we found smaller variation in Pd-doped Cu wire compared to Au and Pd-doped Cu wire. Au bonds were identified to have faster IMC formation, compared to slower IMC growth of Cu. The obtained weibull slope, b of three bonding wires are greater than 1.0 and belong to wearout reliability data point. Pd-doped Cu wire exhibits larger time-to-failure and cycles-to-failure in both wearout reliability tests in Highly Accelerated Temperature and Humidity (HAST) and Temperature Cycling (TC) tests. This proves Pd-doped Cu wire has a greater potential and higher reliability margin compared to Au and Pd-coated Cu wires.en_US
dc.language.isoenen_US
dc.publisherPublic Library of Scienceen_US
dc.subjectGold (Au)en_US
dc.subjectPalladium (Pd) coated Cuen_US
dc.subjectPd-doped Cu wiresen_US
dc.subjectMicroelectronicsen_US
dc.titleComparative reliability studies and analysis of Au, Pd-coated Cu and Pd-doped Cu wire in microelectronics packagingen_US
dc.typeArticleen_US
dc.contributor.urlclgan_pgg@yahoo.comen_US
dc.contributor.urluda@unimap.edu.myen_US


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