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    Bump height at low temperature analysis

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    Bump height at low temperature analysis.pdf (6.052Kb)
    Date
    2013
    Author
    Zaliman, Sauli, Dr.
    Retnasamy, Vithyacharan
    Fairul Afzal, Ahmad Fuad
    Ehkan, Phaklen, Dr.
    Steven, Taniselass
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    Abstract
    The effects of chemical bath time in response to the bump height in electroless nickel immersion gold (ENIG) process was investigated. This paper presents the correlation between electroless process time, immersion gold process time and the bump height. A certain bump height need to be achieved in order to create acceptable solder bumps for reflow process. The study was done using a full factorial design of experiment (DOE). The DOE matrix is made of two levels with two factors. Analysis was done by plotting the main effects plot for each factor. The results suggest that higher process time increases the plating rate where the temperature fixed at 70°C. Electroless nickel time has more influence to the bump height compared to immersion gold time.
    URI
    http://www.scientific.net/AMM.404.77
    http://dspace.unimap.edu.my:80/dspace/handle/123456789/35388
    Collections
    • Steven Taniselass, Mr. [9]
    • Vithyacharan Retnasamy [54]
    • Zaliman Sauli, Lt. Kol. Professor Dr. [55]
    • Fairul Afzal Ahmad Fuad [6]
    • School of Microelectronic Engineering (Articles) [183]
    • School of Computer and Communication Engineering (Articles) [280]

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