Browsing School of Microelectronic Engineering (FYP) by Subject "Chemical Vapor Deposition (CVD)"
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Optimization of Nitride deposition process using Taguchi method
(Universiti Malaysia PerlisSchool Of Microelectronic Engineering, 2008-04)The process of plasma enhanced chemical vapor deposition silicon nitride film which is used as barrier layer for the doped oxide in premetal dielectric (PMD) application and optimized using Design of Experiment (DOE) ...