Browsing School of Microelectronic Engineering (FYP) by Subject "Oxidation"
Now showing items 1-3 of 3
-
Optimization on oxidation process using 2K factorial design method
(Universiti Malaysia PerlisSchool of Microelectronic Engineering, 2008-04)Silicon technologies progress in the last twenty years has traced the path to the unprecedented revolution of information technologies, which has changed everybody’s lifestyles. With the help of software, the world of ... -
Study of the thickness of the Silicon Dioxide on wafer using Dry and Wet Oxidation method
(Universiti Malaysia PerlisSchool of Microelectronic Engineering, 2008-03)Studies of the interaction of O2 and O with Si(100) at a fundamental level are reviewed. Both atomic and molecular chemisorbed species have been found on these surfaces. STM studies have given a great deal of information ... -
Theoretical study, simulation & fabrication of Dry Oxidation in terms of SiO2 layer thickness, resistivity & surface roughness
(Universiti Malaysia PerlisSchool of Microelectronic Engineering, 2008-04)Oxidation is a process used in wafer fabrication. The goal of oxidation is to grow a high quality oxide layer on a silicon substrate. During oxidation a chemical reaction between the oxidants and the silicon atoms produces ...