dc.contributor.author | Norahmad Barzrul Basaruddin | |
dc.date.accessioned | 2008-07-01T03:59:31Z | |
dc.date.available | 2008-07-01T03:59:31Z | |
dc.date.issued | 2007-03 | |
dc.identifier.uri | http://dspace.unimap.edu.my/123456789/1351 | |
dc.description | Access is limited to UniMAP community. | en_US |
dc.description.abstract | The characterization of electroless under bump metallurgy for AlSi bond pad composition in term of surface morphology and surface roughness was investigated. By
using the sample given, the gold layer need to be deposited on top on AlSi first. To
deposit the gold layer, there are seven set-up process steps prior completion of under
bump metallurgy (UBM) deposition, aluminum bond pad activation, first zincation, zinc
removal, second zincation, electroless nickel and immersion gold. Then the completed
sample needs to be analyzed. To obtain the surface roughness and morphology of each
deposition, the Atomic Force Microscopy (AFM) and Scanning Electron Microscope
(SEM) were used. The first zincation process has high surface roughness but preserved
surface morphology of initial thin film surface. The second zincation provides the
improved surface roughness due to the replacement aluminum layer with ion zinc in the solution. | en_US |
dc.language.iso | en | en_US |
dc.publisher | Universiti Malaysia Perlis | en_US |
dc.subject | AlSi bond | en_US |
dc.subject | Aluminum bond pad activation | en_US |
dc.subject | Electroless plating | en_US |
dc.subject | Electroless nickel immersion gold | en_US |
dc.subject | Flip-chip (FC) | en_US |
dc.subject | Surface morphology | en_US |
dc.subject | Integrated circuits -- Design and construction | en_US |
dc.subject | Integrated circuits -- Materials | en_US |
dc.title | Characterization of Electroless Under Bump Metallurgy for Alsi Bond Pad Composition | en_US |
dc.type | Learning Object | en_US |
dc.contributor.advisor | Mohd Khairuddin Md Arshad (Advisor) | en_US |
dc.publisher.department | School of Microelectronic Engineering | en_US |