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dc.contributor.authorNorahmad Barzrul Basaruddin
dc.date.accessioned2008-07-01T03:59:31Z
dc.date.available2008-07-01T03:59:31Z
dc.date.issued2007-03
dc.identifier.urihttp://dspace.unimap.edu.my/123456789/1351
dc.descriptionAccess is limited to UniMAP community.en_US
dc.description.abstractThe characterization of electroless under bump metallurgy for AlSi bond pad composition in term of surface morphology and surface roughness was investigated. By using the sample given, the gold layer need to be deposited on top on AlSi first. To deposit the gold layer, there are seven set-up process steps prior completion of under bump metallurgy (UBM) deposition, aluminum bond pad activation, first zincation, zinc removal, second zincation, electroless nickel and immersion gold. Then the completed sample needs to be analyzed. To obtain the surface roughness and morphology of each deposition, the Atomic Force Microscopy (AFM) and Scanning Electron Microscope (SEM) were used. The first zincation process has high surface roughness but preserved surface morphology of initial thin film surface. The second zincation provides the improved surface roughness due to the replacement aluminum layer with ion zinc in the solution.en_US
dc.language.isoenen_US
dc.publisherUniversiti Malaysia Perlisen_US
dc.subjectAlSi bonden_US
dc.subjectAluminum bond pad activationen_US
dc.subjectElectroless platingen_US
dc.subjectElectroless nickel immersion golden_US
dc.subjectFlip-chip (FC)en_US
dc.subjectSurface morphologyen_US
dc.subjectIntegrated circuits -- Design and constructionen_US
dc.subjectIntegrated circuits -- Materialsen_US
dc.titleCharacterization of Electroless Under Bump Metallurgy for Alsi Bond Pad Compositionen_US
dc.typeLearning Objecten_US
dc.contributor.advisorMohd Khairuddin Md Arshad (Advisor)en_US
dc.publisher.departmentSchool of Microelectronic Engineeringen_US


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