Mohammad Nuzaihan Md Nor, Associate Professor Dr.
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About Associate Professor Dr. Mohammad Nuzaihan Bin Md Nor
Associate Professor Dr. Mohammad Nuzaihan Bin Md Nor is currently Deputy Director at Institute Of Nano Electronic Engineering, Universiti Malaysia Perlis
He was formerly from Microelectronic Engineering
ORCID ID: https://orcid.org/0000-0001-6828-3762
Scopus Author ID: 35183693900
Email: Mohammad Nuzaihan Bin Md Nor
Research Interests
Nanoelectronics
Fabrication
Semiconductor
Microelectronics
Microelectronics and Semiconductor Engineering
News
Skills and Expertise: Nanowire, Nano Structure Formation & E-Beam Lithography.
Recent Submissions
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Design and fabrication of silicon nanowire based sensor
(Electrochemical Science Group (ESG), 2013)This paper reports the process development of silicon nanowires sensor requires both the fabrication of nanoscale diameter wires and standard integration to CMOS process. By using silicon-on-insulator (SOI) wafer as a ... -
Negative Pattern Scheme (NPS) design for nanowire formation using scanning electron microscope based electron beam lithography technique
(Trans Tech Publications, 2014)In this work, we report the used of Negative Pattern Scheme (NPS) by Electron Microscope Based Electron Beam Lithography (EBL) Technique in connection with scanning electron microscope (SEM) for creating extremely fine ... -
Fabrication of silicon nanowires by electron beam lithography and thermal oxidation size reduction method
(Trans Tech Publications, 2014)A simple method for the fabrication of silicon nanowires using Electron Beam Lithography (EBL) combined with thermal oxidation size reduction method is presented. EBL is used to define the initial silicon nanowires of ... -
Carbon nanotubes : Design and fabrication for biosensor applications
(Universiti Malaysia Perlis (UniMAP), 2012-06-18)Carbon nanotubes or known as CNTs are allotropes of carbon with a cylindrical nanostructure. They exhibit extraordinary strength and unique electrical properties, and are efficient thermal conductors [1]. In particular, ... -
The alignment of single SWNTs between electrode using dielectrophoresis
(Universiti Malaysia Perlis (UniMAP), 2012-06-18)This paper presents the development and fabrication of electrical devices based on alignment of carbon nanotubes (CNTs) in single bundle of single-walled carbon nanotubes (sb-SWNTs) using dielectrophoresis (DEP). The Silicon ... -
Application of e-beam lithography for nanowire development
(Universiti Malaysia Perlis (UniMAP)Centre for Graduate Studies, 2010-10-16)Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ... -
Nanowire formation using electron beam lithography
(American Institute of Physics, 2009-06-01)Miniaturization and performance improvements are driving the electronics industry to shrink the feature size of semiconductor device. Because of its diffraction limit, conventional photolithography is becoming increasingly ... -
Pattern designed for combination of optical lithography and electron beam lithography
(Universiti Malaysia Pahang, 2009-06-20)In this paper the fabricated pattern of nanometer and micrometer structures created with electron beam lithography (EBL) and optical lithography on silicon on insulator (SOI) material is presented. The resist used to ... -
Man-2403 resist development for electron beam lithography process
(Universiti Malaysia Pahang, 2009-06-20)Line-width of resist patterns is more susceptible to the developing time than the thickness of the undeveloped resist. This project focused on the development of MaN-2403 resist for e-beam lithography process. The ... -
Design and process development of silicon nanowire based DNA biosensor using electron beam lithography
(Institute of Electrical and Electronics Engineering (IEEE), 2008-12-01)Silicon nanowires (SiNWs) have their unique feature such as similar diameters to biomolecules, chemically tailorable physical properties, enable to apply in biomolecule detection and can be fabricated as a high performance ... -
PMMA characterization and optimization for Nano Structure formation
(Kolej Universiti Kejuruteraan Utara Malaysia, 2005-05-18)The limitations imposed on optical lithography by the wavelength of light have been overcome using electron lithography. Electron lithography offers high resolution because of the small wavelength of the 10-50 keV electrons ...