| dc.contributor.author | Uda, Hashim, Prof. Dr. | |
| dc.contributor.author | Nur Hamidah, Abdul Halim | |
| dc.contributor.author | Mohammad Nuzaihan, Md Nor | |
| dc.contributor.author | Zul Azhar, Zahid Jamal, Prof. Dr. | |
| dc.date.accessioned | 2010-07-20T04:51:51Z | |
| dc.date.available | 2010-07-20T04:51:51Z | |
| dc.date.issued | 2006-05-19 | |
| dc.identifier.uri | http://dspace.unimap.edu.my/123456789/8345 | |
| dc.description | Prof. Dr. Uda Hashim and his team won silver for MOS Transistor Mask Design Using SEM Based E-Beam Lithography at ITEX 2006, 19th - 21st May 2006 at Kuala Lumpur Convention Centre (KLCC), Kuala Lumpur. | en_US |
| dc.description.abstract | Electron beam lithography (EBL) is one of the alternative tools in transferring micro and nano circuit patterns from design editor to the substrate. EBL is state-of-the-art technology for micro and even to nano feature size in direct writing technology. SEM based EBL will be used to define the mask for device fabrication. These masks were designed in GDSII Editor in EBL System. Poly-methyl-metacrylate (PMMA) is used as a resist in the EBL. | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Malaysian Invention & Design Society (MINDS) | en_US |
| dc.relation.ispartofseries | 17th International Invention, Innovation & Technology Exhibition 2006 (ITEX 2006) | en_US |
| dc.subject | E-Beam Lithography (EBL) | en_US |
| dc.subject | MOS Transistor Mask Design | en_US |
| dc.subject | KUKUM -- Research | en_US |
| dc.subject | International Invention, Innovation & Technology Exhibition | en_US |
| dc.subject | ITEX 2006 | en_US |
| dc.title | MOS Transistor Mask Design Using SEM Based E-Beam Lithography | en_US |
| dc.type | Image | en_US |
| dc.contributor.url | uda@kukum.edu.my | en_US |
